| 摘要 |
PURPOSE:To obtain an electronic beam with a desired current density distribution by selecting anyone of the electronic beam shaped by a beam deflection and a shape aperture. CONSTITUTION:An electronic beam radiated from an electronic gun 1 is focussed into a shape spot by a shape aperture and lens 2. The focussed beam is projected onto a second aperture 4, and at this time point, a current density distribution 8 is extended symmetrically about a center. This beam is deflected by a deflection path 3 to select the beam portion passing through the aperture 4. The beam passing through the aperture 4 is contracted by a contraction projecting lens system 5 into a predetermined size and is projected by a deflector 6 onto a d desirable position on the material. As a result, the electronic beam with a deflected distribution can be obtained, whereby correcting a variation of a pattern size due to the close approach to the patterns. |
