发明名称 |
Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device |
摘要 |
There is provided a photosensitive composition containing a compound represented by Formula (I), and the Formula (I) is defined as herein,;
and chemical amplification resist composition containing the photosensitive composition, wherein the photosensitive composition further contains a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and a chemical amplification resist composition containing the photosensitive composition, wherein the photosensitive composition further contains a compound capable of generating an acid upon irradiation with an actinic ray or radiation. |
申请公布号 |
US9488911(B2) |
申请公布日期 |
2016.11.08 |
申请号 |
US201514831801 |
申请日期 |
2015.08.20 |
申请人 |
FUJIFILM Corporation |
发明人 |
Tsuchimura Tomotaka;Sakita Kyouhei |
分类号 |
G03F7/004;G03F7/20;G03F7/32;G03F7/039;G03F7/038;C07D277/64;C07D277/84;C07D413/12 |
主分类号 |
G03F7/004 |
代理机构 |
Jianq Chyun IP Office |
代理人 |
Jianq Chyun IP Office |
主权项 |
1. A photosensitive composition containing a compound represented by the following Formula (I): in Formula (I), Y represents a monovalent organic group that is heterocyclic, R1 represents a monovalent organic group, each of R2 and R2′ independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R2 and R2′ may be bound with each other to form a nitrogen-containing heterocyclic group. |
地址 |
Tokyo JP |