| 摘要 |
PURPOSE:To eliminate unevenness in mask processing, by reducing a contact area between a holder and a mask nearly to the necessary minimum for holding the mask. CONSTITUTION:Holes are provided in part 2 contacting to a mask, in bottom 3, and ends 4 in single holder 1 made of polypropylene so as to reduce a contact area nearly to the limit for holding the mask, and in another case, holes are formed in sides 2 and ends 4 of holder 5 made of a fluorocarbon resin already fixed to a mask processing unit so as to reduce a contact area similarily. Use of a holder of such a structure and reduction of a mask contact area permits processing unevenness in developing and etching to be prevented and baking unevenness in a mask baking process also to be inhibited. |
