| 摘要 |
PURPOSE:To obtain a photomask which permits expulsion of air in a short time at contacting by forming a silicone film having a certain fixed height on the top surface of the figure surface of printing patterns, and forming a flow passage for air by this film part. CONSTITUTION:A silicone film 4 of about 5,000-7,000Angstrom in thicknesses is formed over the entire surface of a transparent plate 1 formed with metal vapor deposition patterns 2 on one side and further a photoresist layer 5 is formed thereon. Thence, ultraviolet rays are irradiated over the entire surface from the back surface 6 side of the transparent plate 1 to expose the photoresist layer 5. After the exposure, the photoresist layer is developed, whereby the photoresist layer 5' is remained only on the top surface of the metal vapor deposition patterns 2. Further, the silicone film layer 4 is dissolved and etched off except the parts 4' corresponding to the unexposed parts, thence the photoresist layer 5' is peeled and only the top surfaces of the metal vapor deposition patterns 2 are coated with the silicone film 4', whereby airflow passages 7 are formed in the clearances between the respective silicone film thicknesses and the titled photomask is thereby obtained. |
