发明名称 真空蒸着装置を用いる蒸着フィルムの製造方法
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a vapor-deposited film using a vacuum vapor deposition system where a mixed film composed of different elements and having a predetermined composition and film thickness is formed stably and continuously for a long time at a high level on the surface of a long-sized film.SOLUTION: A manufacturing method of a vapor-deposited film using a vacuum vapor deposition system that includes material holding means 8 for holding at least two or more different kinds of vapor deposition material in a vacuum chamber, equipped with a partition section 13 for separating the vapor deposition materials, and heating means for heating and evaporating the vapor deposition materials, and forms an inorganic thin film on a film traveling in the vacuum chamber. The heat-transfer coefficient of the partition section 13 in the direction vertical to partition is two or more times the heat-transfer coefficient in the partition direction.SELECTED DRAWING: Figure 2
申请公布号 JP6020704(B2) 申请公布日期 2016.11.02
申请号 JP20150237873 申请日期 2015.12.04
申请人 東洋紡株式会社 发明人 伊関 清司
分类号 C23C14/24 主分类号 C23C14/24
代理机构 代理人
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