| 摘要 |
PURPOSE:To perform fine exposure, by making correction in parallel with the X and Y direction of test piece for the side of the mask hole determining the beam section. CONSTITUTION:CP generation 12, DA conversion 13, and amplification 14 are made with the instruction of the computer 11, allowing to deflect 6 electron beams, and two W wires 8 orthogonal each other are scanned toward X. The electron ray dose detected 9 is grandually reduced into zero. When the Y side of beam is shifted by the angle theta' corresponding to the shift to the mask and test stand, corresponding current waveform can be otained. The peak value of the waveform is detected 18 by differentiating it primarily and secondary 16, 17. This is the signal from each side toward Y of the mask m1. This value is tentatively stored, producing 19 the control signal, and the motor 20 is driven 21, sequentially turning m and approaching the shift theta' to zero. During this, the peak value is compared 19 with the result of scanning before, and if no difference is present with the stored value, the motor is stopped. Thus, unbalance is corrected and exposure can be made with good accuracy. |
