发明名称 |
IMPURITY-DOPED DIAMOND AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide an impurity-doped diamond having a single crystal structure.SOLUTION: An impurity-doped diamond is arranged by doping diamond with an impurity. The impurity-doped diamond comprises at least one of boron and phosphorus as the impurity, in which the concentration of the impurity is 1×10to 1×10cm-3. The high-concentration impurity-doped diamond can be synthesized over a long length of time suitably by a hot filament CVD method, and it has a single crystal structure. A hole activation rate (effective acceptor density/impurity density) calculated as the ratio of an effective acceptor density measured by a transmission FT-IR, and an impurity density measured by a secondary ion mass spectrometry is 95% or more.SELECTED DRAWING: None |
申请公布号 |
JP2016213409(A) |
申请公布日期 |
2016.12.15 |
申请号 |
JP20150098261 |
申请日期 |
2015.05.13 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY |
发明人 |
OMAGARI SHINYA;YAMADA HIDEAKI;CHAYAHARA AKIYOSHI;SHIKADA SHINICHI;MOKUNO YOSHIAKI |
分类号 |
H01L21/205;C01B31/06;C23C16/27;C23C16/44;C30B29/04 |
主分类号 |
H01L21/205 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|