发明名称 IMPURITY-DOPED DIAMOND AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an impurity-doped diamond having a single crystal structure.SOLUTION: An impurity-doped diamond is arranged by doping diamond with an impurity. The impurity-doped diamond comprises at least one of boron and phosphorus as the impurity, in which the concentration of the impurity is 1×10to 1×10cm-3. The high-concentration impurity-doped diamond can be synthesized over a long length of time suitably by a hot filament CVD method, and it has a single crystal structure. A hole activation rate (effective acceptor density/impurity density) calculated as the ratio of an effective acceptor density measured by a transmission FT-IR, and an impurity density measured by a secondary ion mass spectrometry is 95% or more.SELECTED DRAWING: None
申请公布号 JP2016213409(A) 申请公布日期 2016.12.15
申请号 JP20150098261 申请日期 2015.05.13
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY 发明人 OMAGARI SHINYA;YAMADA HIDEAKI;CHAYAHARA AKIYOSHI;SHIKADA SHINICHI;MOKUNO YOSHIAKI
分类号 H01L21/205;C01B31/06;C23C16/27;C23C16/44;C30B29/04 主分类号 H01L21/205
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