| 摘要 |
PURPOSE:To obtain a practical area of uniform coloring density and uniform coloring speed with low voltage driving by using a reduction coloring type EC material layer and an oxidation coloring type EC material layer in complementary type. CONSTITUTION:After the 1st electrode layer 12 consisting of a transparent conductive film is formed on the 1st substrate 11, a WO3 layer 13 of 5,000Angstrom film thickness is formed thereon by a physical vapor deposition (expressed as PVD hereunder) method. Following to this, an LiI layer 14 of 8,000Angstrom film thickness, an SiOx (1<X<2) layer 15 of 2,000Angstrom film thickness and an iridium oxide layer 16 of 1,000Angstrom film thickness are formed in lamination successively by the PVD method. On the other hand, the 2nd electrode layer 18 consisting of a tansparent conductive film is formed on the 2nd substrate 17, after which the 1st substrate and the 2nd substrate are faced to each other and are mechanically stuck by about 1kg/cm<2> pressure. The electrode layer showing sufficiently low electric resistance is obtained uniformly by forming the 2nd electrode layer beforehand on the 2nd substrate. |
