Substrate transfer antechamber mechanism

摘要

There is provided a substrate transfer antechamber mechanism for a compact manufacturing apparatus that produces various types of devices in small volume using a small-diameter processing substrate at low cost. A container placement table, on which a wafer transfer container housing a semiconductor wafer is placed, is provided on an upper surface of an apparatus antechamber for a compact semiconductor manufacturing apparatus, and the apparatus antechamber includes therein a wafer elevating mechanism and a horizontal transfer mechanism. The wafer elevating mechanism moves down while holding from below a delivery bottom of the wafer transfer container, on which the semiconductor wafer remains placed, to transfer the semiconductor wafer into the apparatus antechamber. The horizontal transfer mechanism transfers the semiconductor wafer into a processing chamber using a transfer arm that receives the semiconductor wafer from the delivery bottom and extends.

主权项

1. A substrate transfer antechamber mechanism for a manufacturing apparatus including a processing chamber that performs processing of a processing substrate, and an apparatus antechamber that transfers the processing substrate into and out of the processing chamber, the mechanism comprising:
a container placement table provided on an upper surface of a casing of the apparatus antechamber onto which a substrate transfer container is detachably settable from an outside of the casing, the substrate transfer container having a delivery bottom onto which the processing substrate is disposed on; an inlet provided to the casing of the apparatus antechamber, through which the delivery bottom of the substrate transfer container set on the container placement table is transferred into the apparatus antechamber; a substrate elevating mechanism provided in the apparatus antechamber, which moves down while being held from below the delivery bottom of the substrate transfer container, on which the processing substrate remains placed, to transfer the processing substrate into the apparatus antechamber through the inlet; and a horizontal transfer mechanism provided in the apparatus antechamber to transfer the processing substrate into the processing chamber using a transfer arm that receives the processing substrate from the delivery bottom and extends in a horizontal direction, wherein a base of the transfer arm is disposed inside the casing of the apparatus antechamber.