发明名称 Processing systems and apparatus adapted to process substrates in electronic device manufacturing
摘要 A via pass-through apparatus is disclosed. The via pass-through apparatus includes a pass-through chamber adapted to couple between a first mainframe section and a second mainframe section of a substrate processing system, the pass-through chamber including an entry and an exit each having a slit valve, and a via process chamber located at a different level than the pass-through chamber wherein the via process chamber is adapted to carry out a process on a substrate at the via location. Systems and methods of operating the system are provided, as are numerous other aspects.
申请公布号 US9524889(B2) 申请公布日期 2016.12.20
申请号 US201414202763 申请日期 2014.03.10
申请人 Applied Materials, Inc. 发明人 Hongkham Steve S.;Reuter Paul B.;Englhardt Eric A.;Balasubramanian Ganesh;Chen Xinglong;Rocha-Alvarez JuanCarlos
分类号 B01J19/00;H01L21/67 主分类号 B01J19/00
代理机构 Dugan & Dugan, PC 代理人 Dugan & Dugan, PC
主权项 1. An electronic device processing system, comprising: a first mainframe section including a first housing defining a first transfer chamber and one or more process chambers coupled to the first housing and including a first robot configured to move substrates; a second mainframe section including a second housing defining a second transfer chamber and one or more process chambers coupled to the second housing and including a second robot configured to move substrates; a via pass-through apparatus coupled between the first mainframe and the second mainframe, the via pass-through apparatus providing the only entrance to and exit from the second mainframe section including: a first pass-through chamber coupled between the first mainframe and the second mainframe, wherein the first pass-through chamber is accessible by both the first robot and the second robot, anda via process chamber adapted to carry out a process on a substrate, the via process chamber located at a different level than the first pass-through chamber, the via process chamber comprising a lift assembly to lift a substrate within the via process chamber, the lift assembly including a hoop-shaped lift frame, a lift actuator coupled to and positioned beneath the lift frame, and a plurality of fingers coupled to the periphery of the lift frame and extending beneath the lift frame to support the substrate; and one or more load lock chambers coupled to the first housing of the first mainframe section on a side of the first mainframe section opposite from the via pass-through apparatus.
地址 Santa Clara CA US