发明名称 |
Memory cell having closed curve structure |
摘要 |
A memory cell including a drain, a channel, and a floating gate. The channel surrounds the drain and includes a first rounded closed curve structure around the drain. The floating gate is situated over the channel and includes a second rounded closed curve structure over the channel. |
申请公布号 |
US9524780(B2) |
申请公布日期 |
2016.12.20 |
申请号 |
US201114000620 |
申请日期 |
2011.03.15 |
申请人 |
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. |
发明人 |
Villavelez Reynaldo V;Mikulan Paul I. |
分类号 |
G11C5/06;G11C16/10;H01L21/28;H01L27/115;H01L29/788;H01L29/423;H01L29/66;H01L29/06 |
主分类号 |
G11C5/06 |
代理机构 |
Dicke, Billig & Czaja PLLC |
代理人 |
Dicke, Billig & Czaja PLLC |
主权项 |
1. An EPROM memory cell suitable for an EEPROM array, the EPROM memory cell comprising:
a drain including a top and a bottom, wherein the drain is formed of an N+ doped region; a channel that surround the drain and includes a first rounded closed curve structure around an entire surface area of the drain including a surface area of the bottom of the drain, wherein the channel is formed of a P doped region, wherein the first rounded closed curve structure increases uniformity of the length of the channel throughout the width of the channel relative to a rectangular channel; a control gate situated over the channel; and a floating gate capacitively coupled to the control gate, wherein the floating gate is situated over the channel and includes a second rounded closed curve structure over the channel to form the EPROM memory cell. |
地址 |
Houston TX US |