发明名称 SPUTTERING DEVICE
摘要 PURPOSE:To make the thickness of the films formed on the work uniform by providing a grating-like member of different densities between one of the surfaces of a target and the work. CONSTITUTION:If gaseous Ar is introduced into a chamber 1 and air is released therefrom, glow discharge takes place between a holder 2 and a metallic part 5, and gaseous Ar plasma is generated, then Ar<+> collides against a target 3, and sputters, for example, Cr atoms. Since a magnet 6 is provided radially to a circular holder 2, the magnetic field is strongest in the central part of the magnet 6. The Ar<+> collides most against the target 3 in this part and sputters Cr atoms much. Therefore, the many Cr atoms scattered by the dense parts 8' of a grating-like member 8 provided between the target 3 and the work 4 are suppressed, whereby the film thickness of the Cr films 3' stuck on the work is made uniform.
申请公布号 JPS57161064(A) 申请公布日期 1982.10.04
申请号 JP19810047419 申请日期 1981.03.31
申请人 FUJITSU KK 发明人 NAGASHIMA SETSUO
分类号 C23C14/36;C23C14/04;C23C14/34;C23C14/35;H01L21/285;H01L21/31 主分类号 C23C14/36
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