| 摘要 |
PURPOSE:To form a vapor-deposited film pattern of high accuracy by tightly holding a substrate between a substrate support and a masking plate by sucking force acting between them and by vapor-depositing a prescribed material on the substrate through the pattern holes of the masking plate. CONSTITUTION:A substrate 1 for forming a vapor-deposited film is put between a magnetized substrate support 7 and a masking plate 8 made of a magnetically sensitive material. The substrate 1 is tightly held between the plate 8 and the support 7 by sucking force acting between them, so the plate 8 is fixed on the whole surface of the substrate 1 while in contact with the surface. As a result, the deformation of the masking plate 8 due to thermal expansion can be prevented, and since the contact of the substrate 1 with the plate 8 can be ensured, the pattern accuracy can be increased. |
