Substrate cleaning apparatus and substrate processing apparatus

摘要

A substrate cleaning apparatus which can sufficiently clean a pen-sponge in its entirety, and can prevent particles, which have been once removed, from being reattached to the pen-sponge is disclosed. The substrate cleaning apparatus includes: a substrate holder configured to hold and rotate a substrate; a sponge cleaning tool to be brought into contact with a surface of the substrate; a cleaning element provided adjacent to the substrate held by the substrate holder; and a cleaning-tool moving mechanism configured to bring the sponge cleaning tool into contact with the cleaning element. The cleaning element has a cleaning surface that is to come in contact with the sponge cleaning tool, and a central portion of the cleaning surface is located at a higher position than a portion, of the cleaning surface, outside the central portion.

主权项

1. A substrate cleaning apparatus comprising:
a substrate holder configured to hold and rotate a substrate; a sponge cleaning tool to be brought into contact with a surface of the substrate; a cleaning element provided adjacent to the substrate held by the substrate holder; and a cleaning-tool moving mechanism configured to bring the sponge cleaning tool into contact with the cleaning element, the cleaning element having a cleaning surface that is to come in contact with the sponge cleaning tool, and a central portion of the cleaning surface being located at a higher position than a portion, of the cleaning surface, outside the central portion, wherein the cleaning element has a central outlet located in the central portion of the cleaning surface, and a fluid passage communicating with the central outlet, and a fluid supply line, which is configured to supply fluid to the fluid passage, is coupled to the cleaning element.