Method and apparatus for direct formation of nanometer scaled features

摘要

An apparatus and use of the apparatus to form nanometer sized features on a workpiece includes a plurality of individually biasable tips, and each tip has a diameter on the scale or 10 nm or less. By moving the tips above the surface of a workpiece in the presence of reactants, features can be directly formed on the workpiece on a sub-micron size, below the resolution of current photolithography. The features may be etched into a workpiece, or formed thereover.

主权项

1. A method of forming a tip plate useful for the direct formation of features on a workpiece, comprising;
providing a substrate; forming a plurality of interconnects terminating therein; forming a plurality of transistors on or in the substrate, and connecting a source or drain of a transistor of the plurality of transistors to an interconnect of the plurality of interconnects; and pattern etching the substrates to form tips having an alignment such that an individual tip is formed over each interconnect.