| 摘要 |
PURPOSE:To obtain a photoconductive material suitable for electrophotgraphy, and superior in light fatigue resistance, etc., by successively forming on a substrate, an auxiliary layer, a charge injection inhibiting layer, first and second amorphous layers, all of them consisting of amorphous material contg. silicon as a principal component. CONSTITUTION:An auxiliary layer 102 composed of amorphous material contg. N up to 43 atomic %, as a constitutent, and Si as a main component is formed by the glow discharge method or the like. On this layer 102, a charge injection preventive layer 103 is formed contg. Si as a main component, and an atom of group V of the periodic table, such as As as a component. On this layer 103 a first photoconductive layer 104 is formed contg. Si as a main component, and on this layer 104, a second amorphous layer 105 is formed consisting Si, C, and halogen, thus forming an objectivephoto conductive material 100. All the layers 102, 103, 104, 105 are made of an amorphous material contg. Si as a main component. |
