| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment device capable of easily recovering the fragments of a film and capable of easily performing maintenance.SOLUTION: In a state where a capture member 25 is located at a recovery position, a lifter 9 is located at a treatment position, and a substrate W is subjected to peeling treatment. Then, a photoresist film peeled out from the substrate W is drifted inside a treatment tank 3, and is exhausted to the side of an overflow tank 5 by the liquid flow of a peeling liquid. At this time, since the fragments of the exhausted photoresist film are caught in a catch member 25, when the catch member 25 is moved to a waste position, the fragments of the film caught in the catch member 25 are disposed of. Thus, the fragments of the photoresist film can be easily recovered, and maintenance can be easily performed.SELECTED DRAWING: Figure 1 |
