| 摘要 |
PURPOSE:To enable a carbon layer to be formed in a high accuracy fine pattern with high adhesive strength, by hardening a photosensitive material layer with tannic acid treatment liquid, and after that by neutralizing the residual tannic acid treatment liquid remaining inside a panel with ammonium compound solution. CONSTITUTION:An azide system photosensitive material layer 2 is applied to the overall inside plane of a panel 1, exposure treatment is applied with an aperture grille as a mask, and developing treatment is applied, thereby stripes of a photosensitive agent 2 are formed. Thereafter, hard film treatment is performed by allowing tannic acid treatment liquid to flow sufficiently over the complete range inside the panel 1. Next, stuck and remaining tannic acid is neutralized and removed by pouring ammonium solution over the whole inside plane of the panel 1. Thereafter, light absorbing carbon layer 3 is applied generally, and azide system photosensitive material layer 2 is removed by its appropriate solvent, for example, oxygenated water. Thus, only the part, to which it is directly stuck, in the inside plane of the panel 1 is left, and a stripe pattern of a carbon layer 2 in which a stripe pattern of the photosensitive layer 2 is turned over is formed. |
