| 摘要 |
PURPOSE:To perform the projecting exposure by sufficient light amount without absorption of far ultraviolet rays by filling the far ultraviolet ray passage of a far ultraviolet ray projecting exposure device with nitrogen gas or argon gas. CONSTITUTION:Far ultraviolet rays from a light source 1 become parallel rays by a reflecting mirror 2, and contracted and projected through a mask 3, a prism 4 and a reflecting lens 5 on the surface of an Si wafer 6 on a stage as an image of the mask 3. Nitrogen gas is filled from a nozzle 10 in a barrel 7, the nitrogen gas is eventually filled in a ray passage 11 of the far ultraviolet rays to prevent the rays from being absorbed. |
