| 摘要 |
PURPOSE:To prevent any contamination by an oily substance so as to more efficiently apply a black substance by performing the process of treating with an alkaline solution containing a surfactant after the development of the resist is performed during the formation of a black matrix. CONSTITUTION:After a photosensitive resist liquid is applied to the inner surface of a panel to form a film, the film is sensitized using a shadow mask to expose it. Then, the unsensitized resist is removed to form a resist pattern. Next, after the inner surface of the panel is treated with an alkaline solution containing a surfactant, a black substance is applied to the inner surface to decompose the resist pattern. After that, the black substance is developed leaving a black matrix. Finally, phosphor elements are formed thereby obtaining a fluorescent layer. Therefore there is no possibility that the surface of the resist pattern is contaminated by oily dust or the like. Accordingly it is possible to reduce the occurrence of defects by more efficiently apply a graphite liquid. |
