| 摘要 |
PURPOSE:To enhance the photosensitivity and abrasion resistance by providing a layer of a mixture consisting of amorphous silicon powder and a heat-resistant polyimide resin on an electrically conductive substrate, and forming an amorphous silicon film thereon with the glow-discharge decomposition method. CONSTITUTION:The amorphous silicon (a-Si) powder and a poyimide resin are mixed in 1:1 weight ratio of the powder to the solid component of the resin, and methyl ethyl ketone is added to obtain suitable viscosity. The mixture is thereafter shaked with steel balls, etc., and disposed. Then the dispersed liquid is coated on an electrically conductive substrate 1 such as an aluminum sheet with a spinner, and dried at 80 deg.C for 1hr, for example. The resin is cured at 200 deg.C for 2hr to form a resinous layer 2 having 20mum thickness wherein the a-Si powder is dispersed. Then a homogeneous a-Si film 3 having 3mu thickness is formed on the resinous layer 2 with the glow-discharge method at 200 deg.C substrate temp. by using gaseous hydrogen contg. 10% SiH4 as a starting material, and mixing about 100ppm gaseous B2H6. |
