发明名称 Contact pad structure
摘要 A contact pad structure includes alternately stacked N insulating layers (N≧6) and N conductive layers, and has N regions arranged in a 2D array exposing the respective conductive layers. When the conductive layers are numbered as first to N-th from bottom to top, the number (Ln) of exposed conductive layer decreases in a column direction in the regions of any row, the difference in Ln is fixed between two neighboring rows of regions, Ln decreases from the two ends toward the center in the regions of any column, and the difference in Ln is fixed between two neighboring columns of regions.
申请公布号 US9508645(B1) 申请公布日期 2016.11.29
申请号 US201615099316 申请日期 2016.04.14
申请人 MACRONIX International Co., Ltd. 发明人 Lin Chih-Yao
分类号 H01L23/48;H01L23/528;H01L23/522 主分类号 H01L23/48
代理机构 J.C. Patents 代理人 J.C. Patents
主权项 1. A contact pad structure, comprising alternately stacked N insulating layers (N≧6) and N conductive layers, and having N regions exposing the respective conductive layers, wherein the regions are arranged in a P×Q array (P≧3, Q≧2), and when the conductive layers are numbered from first to N-th from bottom to top and the conductive layer exposed in a region (i, j) is designated as an Lni,j-th conductive layer, in the Q regions in the i-th row, Lni,j decreases with increase of the j value, satisfying the relationships of Lni,1>Lni,2> . . . >Lni,Q, a difference in Ln between the Q regions of the i-th row and the Q regions of the (i+1)-th row is fixed, satisfying the relationship of Lni,1−Lni+1,1=Lni,2−Lni+1,2= . . . =Lni,Q−Lni+1,Q, in the P regions of the j-th column, Lni,j decreases from two ends toward a center, satisfying the relationship of Ln1,j, LnP,j>Ln2,j, LnP−1,j> . . . , and a difference in Ln between the P regions of the j-th column and the P regions of the (j+1)-th column is fixed, satisfying the relationship of Ln1,j−Ln1,j+1=Ln2,j−Ln2,j+1= . . . =LnP,j−LnP,j+1.
地址 Hsinchu TW