| 摘要 |
<p>Method and Apparatus for Coating Semiconductive Materials Excessive heat-generating current levels produced in simiconductive materials by electrostatically assisted coating apparatus employed to, for example, improve the uniformity of a coating applied to such materials are avoided by passing an auxiliary current through said semiconductive materials in the same region and in a direction opposite to that of the current produced by said electrostatically assisted coating apparatus such that the difference between the said current produced by said electrostatically assisted coating apparatus and the said auxiliary current is less than or equal to a predetermined value.</p> |
