| 摘要 |
PURPOSE:To form film having high adhesiveness and uniform thickness on a base by providing a cathode between an ion accelerating means provided in a vacuum chamber and a base support means and constituting a device with an ion acceleration. CONSTITUTION:An anode 5 for ionization is provided on an evaporation source 3 and the vicinity thereof in a vacuum chamber 1. Further, in an ion plating device in which a base holder 8 is installed apart from the anode 5, the cathode 11 for ion acceleration is provided between the anode 5 and the holder 8. In the device, reaction gas is introduced from a gas introducing port 15 in the vacuum chamber 1, which is exhausted to vacuum from a conductor 2. On the other hand, the evaporation of an evaporation material 4 is generated by an electric gun or the like of the evaporation source 3. The reaction gasses are ionized and activated by the anode 5 for ionization and accelerated by the ion acceleration cathode 11 and drawn to the base holder 8 to form a film having strong adhesiveness and uniform thickness on the base without the increase of impressed voltage to the base holder 8. |
