| 摘要 |
PURPOSE:To solve problems of the limit of the throughput of a vapor deposition process, the sticking of dust, etc., and scratches, etc., by dividing a detaching work of a mask unit and a disk into plural processes. CONSTITUTION:At a loading process I, a disk supplying part A, an idler part B, a mask fitting part C, a static blow part D, a mask unit shifting and loading part E, mask unit detaching work parts F1 and F2, an outer circumferential mask removing part G, a static blow part H, a center mask removing part I, an idler part J, and a pallet 4 for circulating a disk removing part K are used by a square circulating base machine 3. The mask unit 6, which is removed from an vapor-depositing holder 5 and shifted to one side mounting part 4a of the pallet 4 in the mask unit desorption work part F1 or F2, is shifted to the outer circumferential mask removing part G by the pallet 4, and then, an outer circumferential mask 9 is removed by an outer circumferential mask removing device 10. The removed outer circumferential mask 9 is shifted to other mounting part 4b of the same pallet 4. A worker only detaches the mask unit 6 by shifting alternately to the mask unit detaching work parts F1 and F2. |
