发明名称 |
Sulfonium salt compound, method for producing the same, and photoacid generator |
摘要 |
Provided is a sulfonium salt compound represented by the following general formula (I):;
where R1 and R2 each denote the same or a different alkyl group having 1 to 18 carbon atoms, R3 and R4 each denote the same or a different alkyl group having 1 to 10 carbon atoms, and X− denotes a sulfone imide anion or a perfluoroalkanesulfonic acid anion, wherein the substituents denoted by R3O and R4O are each located at an arbitrary position selected from the 2-position to the 8-position of the naphthyl group. |
申请公布号 |
US9465288(B2) |
申请公布日期 |
2016.10.11 |
申请号 |
US201314648655 |
申请日期 |
2013.12.03 |
申请人 |
DSP GOKYO FOOD & CHEMICAL CO., LTD. |
发明人 |
Kinoshita Hironori;Kisanuki Sumitsugu;Sugi Masaaki |
分类号 |
G03F7/004;C07C381/00;C07C311/48;C07C381/12;G03F7/039;C07D285/15 |
主分类号 |
G03F7/004 |
代理机构 |
Knobbe, Martens, Olson & Bear LLP |
代理人 |
Knobbe, Martens, Olson & Bear LLP |
主权项 |
1. A sulfonium salt compound represented by the following general formula (I):wherein R1 and R2 each denote the same or a different alkyl group having 1 to 18 carbon atoms, R3 and R4 each denote the same or a different alkyl group having 1 to 10 carbon atoms, and X− denotes a sulfone imide anion or a perfluoroalkanesulfonic acid anion represented by the formula (IV):
R8—SO3− (IV), wherein R8 denotes an alkyl group having 2 to 4 carbon atoms in which all hydrogen atoms are substituted by fluorine atoms, and wherein the substituents denoted by R3O and R4O are each located at an arbitrary position selected from the 2-position to the 8-position of the naphthyl group. |
地址 |
Osaka JP |