发明名称 Method of detecting arc discharge in a plasma process
摘要 An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator configured to emit an arc discharge detection signal and receive an instantaneous value of the signal or a signal proportional thereto, a minimum or maximum value detection device configured to receive the signal and to determine a minimum or maximum value of the signal within a predetermined time period, a setting means configured to receive the minimum or maximum value and to generate a reference signal from the minimum or maximum value, such that the reference signal is supplied to the comparator, and such that the comparator changes the signal level of the arc discharge detection signal when the comparator detects that the instantaneous value has reached the reference signal.
申请公布号 US9484189(B2) 申请公布日期 2016.11.01
申请号 US201113191960 申请日期 2011.07.27
申请人 TRUMPF Huettinger GmbH + Co. KG 发明人 Winterhalter Markus;Wiedemuth Peter
分类号 H01H9/50;H01J37/32 主分类号 H01H9/50
代理机构 Fish & Richardson P.C. 代理人 Fish & Richardson P.C.
主权项 1. A plasma process arc discharge detection device, comprising: a comparator receiving a detection value that is one of an instantaneous value of an input signal associated with a plasma process and a secondary value proportional to the instantaneous value; an extreme value detection device that receives the input signal and determines an extreme value of the input signal within a predetermined time period, the extreme value corresponding to a minimum or maximum value of the input signal during the predetermined time period; and a reference signal generator that receives the extreme value, generates a reference signal from the extreme value, and provides the generated reference signal to the comparator, wherein the comparator emits an arc discharge detection signal that changes when the detection value has reached the reference signal.
地址 Freiburg DE