发明名称 Charged particle beam apparatus and trajectory correction method in charged particle beam apparatus
摘要 There is provided a charged particle beam apparatus that includes a trajectory monitoring unit which is disposed above an objective lens (14) and which includes an optical element (12) having a lens action and a trajectory correcting deflector (10). An applied voltage and an excitation current of the optical element (12) are set to zero after a trajectory correction of a primary charged particle beam (30). Accordingly, the lens action and an aberration of the optical element (12) have no influence on resolution.
申请公布号 US9484181(B2) 申请公布日期 2016.11.01
申请号 US201414760053 申请日期 2014.01.21
申请人 Hitachi High-Technologies Corporation 发明人 Dohi Hideto;Ikegami Akira;Kazumi Hideyuki
分类号 H01J37/147;H01J37/153;H01J37/28;H01J37/22 主分类号 H01J37/147
代理机构 Crowell & Moring LLP 代理人 Crowell & Moring LLP
主权项 1. A charged particle beam apparatus comprising: a charged particle source for supplying a primary charged particle beam; a condenser lens for controlling a focusing angle and a focusing position of the primary charged particle beam; an objective lens for focusing the primary charged particle beam on a sample; a scanning device that scans the sample with the primary charged particle beam; a detector that detects charged particles which are generated from the sample; an image processing device that forms a sample image based on a signal from the detector; and a trajectory monitoring unit that is disposed above the objective lens and includes an optical element having a lens action and a trajectory correcting deflector, wherein an applied voltage and an excitation current of the optical element are set to zero after a trajectory correction of the primary charged particle beam.
地址 Tokyo JP