Method for coating substrates in a vacuum chamber

摘要

In the previous methods for the deposition of coatings on surfaces by means of chemical reactions using gases which are introduced into the reaction chamber (Chemical Vapour Deposition, CVD), electric glow discharges and above all high-frequency discharges were used to activate the reactants. According to the invention, it is proposed to maintain a low-voltage arc discharge in the reaction chamber during the coating. Surprisingly, this produces a much greater activation and ionisation and a more uniform coating even on surfaces of complicated shape. <IMAGE>