发明名称 ELECTROLESS PLATING BATH
摘要 PURPOSE:To improve the uniformity of a magnetic film formed by electroless plating by adding Zn ions to an aqueous soln. contg. Co ions, Ni ions, a reducing agent and a complexing agent. CONSTITUTION:Zn ions are added to an electroless plating bath contg. Co ions, Ni ions, a reducing agent for the metallic ions, a pH buffer, a pH adjusting agent and a complexing agent for the metallic ions. The coercive force Hc of a magnetic Co-Ni-P film is changed by regulating the amount of Zn ions added, so a magnetic film having controlled desired magnetic characteristics is formed. Since Zn ions smoothen the plated surface, the uniformity of the magnetic film is improved.
申请公布号 JPS6210279(A) 申请公布日期 1987.01.19
申请号 JP19850147986 申请日期 1985.07.05
申请人 MITSUBISHI ELECTRIC CORP 发明人 IKEMOTO KAZUYUKI;WATANABE KANJI
分类号 C23C18/34;C23C18/50 主分类号 C23C18/34
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