发明名称 METHOD AND APPARATUS FOR PLASMA TREATMENT
摘要 PURPOSE:To enable the entire surface of an article to be treated to be uniformly irradiated with plasma, by sucking plasma gas ejected from a plasma ejecting pipe, through either one of a main exhaust vent and sub-exhaust vents and then sucking it through the other. CONSTITUTION:In a chamber 1 provided with a plasma ejecting pipe 10, a main exhaust vent 2 and sub-exhaust vents 3, a synthetic resin article B to be treated is placed among the pipe 10, the main exhaust vent 2 and the sub- exhaust vents 3. The chamber 1 is evacuated and plasma gas ejected from the plasma ejecting pipe 10 is sucked through either one of the main exhaust vent 2 and the sub-exhaust vents 3 and then through the other. In this way, the entire surface of the article B can be uniformly irradiated with plasma.
申请公布号 JPS6210140(A) 申请公布日期 1987.01.19
申请号 JP19850148574 申请日期 1985.07.06
申请人 TOYODA GOSEI CO LTD 发明人 MANABE KATSUHIDE;OGISU YASUHIKO
分类号 B01J19/08;B29C59/14;B29C71/04;C08J7/00 主分类号 B01J19/08
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