发明名称 |
Color filter and method of making the same |
摘要 |
A color filter and a method of making the same are disclosed. The method for fabricating a color filter has the steps of: providing a substrate; forming a black matrix layer on the substrate; using a mask to form at least one first light-filtering pattern on the substrate provided with the black matrix layer; using the mask to form at least one second light-filtering pattern on the substrate provided with the black matrix layer and the first light-filtering pattern; using the mask to form at least one third light-filtering pattern on the substrate provided with the black matrix layer, the first light-filtering pattern and the second light-filtering pattern, wherein the mask has different transmission spectra corresponding to the first light-filtering pattern, the second light-filtering pattern and the third light-filtering pattern, respectively. |
申请公布号 |
US9494719(B2) |
申请公布日期 |
2016.11.15 |
申请号 |
US201414384388 |
申请日期 |
2014.05.06 |
申请人 |
Shenzhen China Star Optoelectronics Technology Co., Ltd. |
发明人 |
Xu Xiangyang |
分类号 |
G03F7/20;G02B5/20;G03F7/00;G02B5/22 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
1. A method for fabricating a color filter, comprising the steps of:
providing a substrate; forming a black matrix layer on the substrate; coating a first photoresist material on the substrate provided with the black matrix layer, and forming at least one first light-filtering pattern through a mask by ultraviolet exposure and developing the substrate coated with the first photoresist material which has a photosensitive frequency in a transmission spectrum range of the mask corresponding to the first light-filtering pattern; coating a second photoresist material on the substrate provided with the black matrix layer and the first light-filtering pattern, and forming at least one second light-filtering pattern through the mask by ultraviolet exposure and developing the substrate coated with the second photoresist material which has a photosensitive frequency in a transmission spectrum range of the mask corresponding to the second light-filtering pattern; and coating a third photoresist material on the substrate provided with the black matrix layer, the first light-filtering pattern and the second light-filtering pattern, and forming at least one third light-filtering pattern through the mask by ultraviolet exposure and developing the substrate coated with the third photoresist material which has a photosensitive frequency in a transmission spectrum range of the mask corresponding to the third light-filtering pattern. |
地址 |
Shenzhen CN |