发明名称 |
Method of making and assembling capsulated nanostructures |
摘要 |
An encapsulated nanostructure fabricated using layers of polymer material and further processed for use in a micro-scale target device is presented. The fabrication includes the formation on a substrate of an array of encapsulated nanostructures. The encapsulated nanostructures each include a nanostructure and a micro-scale, multi-block structure that encapsulates the nanostructure. Each encapsulated nanostructure can be made usable by a target device by removing, e.g., by etching, one of the layers to expose a portion of the nanostructure. |
申请公布号 |
US9494615(B2) |
申请公布日期 |
2016.11.15 |
申请号 |
US200912611222 |
申请日期 |
2009.11.03 |
申请人 |
Massachusetts Institute of Technology |
发明人 |
Kim Sang-Gook;Kim Soohyung;Lee Hyung Woo |
分类号 |
G01Q70/12;B82Y15/00;B82Y35/00;B82Y30/00 |
主分类号 |
G01Q70/12 |
代理机构 |
Daly, Crowley, Mofford & Durkee, LLP |
代理人 |
Daly, Crowley, Mofford & Durkee, LLP |
主权项 |
1. A method of producing nanostructures comprising:
forming on a substrate an array of encapsulated nanostructures, the encapsulated nanostructures in the array including nanostructures and multi-block structures to encapsulate the nanostructures; wherein forming comprises:
disposing catalytic material at sites on the substrate;growing the nanostructures on the sites of the catalytic material;providing layers of polymers, including at least a bottom layer and a top layer, over the nanostructures; andprocessing the layers of polymers to form the multi-block structures; wherein the top layer and the bottom layer are chosen to have etching selectivity to each other; and wherein the bottom layer comprises a layer of polymethylglutarimide and the top layer comprises a layer of SU-8. |
地址 |
Cambridge MA US |