发明名称 Method of making and assembling capsulated nanostructures
摘要 An encapsulated nanostructure fabricated using layers of polymer material and further processed for use in a micro-scale target device is presented. The fabrication includes the formation on a substrate of an array of encapsulated nanostructures. The encapsulated nanostructures each include a nanostructure and a micro-scale, multi-block structure that encapsulates the nanostructure. Each encapsulated nanostructure can be made usable by a target device by removing, e.g., by etching, one of the layers to expose a portion of the nanostructure.
申请公布号 US9494615(B2) 申请公布日期 2016.11.15
申请号 US200912611222 申请日期 2009.11.03
申请人 Massachusetts Institute of Technology 发明人 Kim Sang-Gook;Kim Soohyung;Lee Hyung Woo
分类号 G01Q70/12;B82Y15/00;B82Y35/00;B82Y30/00 主分类号 G01Q70/12
代理机构 Daly, Crowley, Mofford & Durkee, LLP 代理人 Daly, Crowley, Mofford & Durkee, LLP
主权项 1. A method of producing nanostructures comprising: forming on a substrate an array of encapsulated nanostructures, the encapsulated nanostructures in the array including nanostructures and multi-block structures to encapsulate the nanostructures; wherein forming comprises: disposing catalytic material at sites on the substrate;growing the nanostructures on the sites of the catalytic material;providing layers of polymers, including at least a bottom layer and a top layer, over the nanostructures; andprocessing the layers of polymers to form the multi-block structures; wherein the top layer and the bottom layer are chosen to have etching selectivity to each other; and wherein the bottom layer comprises a layer of polymethylglutarimide and the top layer comprises a layer of SU-8.
地址 Cambridge MA US