发明名称 PROCESSING METHOD FOR PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To prevent wasteful use of water, by processing a photosensitive lithographic plate with an aqueous solution containing a surface active agent immediately after the plate is developed by using the same developing solution which is repeatedly used. CONSTITUTION:A developing section is composed principally of a developing tank 1, carrying rollers 3, a brush roller 4, solution supplying nozzles 8, squeezing rollers 5, tandem roller pairs 6, receiving rollers 7, developing solution storing tank 10, and developing solution supplying pump 9 and, at the time of development, the pump 9 is actuated and a developing solution is supplied to a photosensitive lithographic plate from the nozzles 8. The used developing solution is squeezed by the rollers 5 and returned to the tank 10. Thus the solution is circularly used. A surface active agent solution processing section is composed principally of a surface active agent solution processing tank 2, carrying rollers 3', tandem roller pairs 6', squeezing rollers 5', and solution supplying nozzles 8' and supplies a surface active agent solution which is circularly used by means of a pump 11 to the lithographic plate coming out from the developing section through the nozzles 8'.
申请公布号 JPS6258253(A) 申请公布日期 1987.03.13
申请号 JP19850175400 申请日期 1985.08.08
申请人 KONISHIROKU PHOTO IND CO LTD 发明人 UEHARA MASABUMI;NAKAI HIDEYUKI;KIYONO MINORU;KOMENO ATSUO
分类号 G03F7/30 主分类号 G03F7/30
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