发明名称 WAFER PRODUCING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a wafer producing method for efficiently producing a wafer from an ingot.SOLUTION: A wafer producing method for producing a wafer from a hexagonal single crystal ingot comprises a reformed layer forming step for positioning the focal point of a laser beam of a wavelength having transmissivity to the hexagonal single crystal ingot at a depth equivalent to the thickness of the wafer to be produced from the surface, relatively moving the focus point and the hexagonal single crystal ingot to irradiate the surface with the laser beam, and forming a reformed layer parallel to the surface and a crack extending from the reformed layer. The reformed layer forming step irradiates the laser beam so that the focal point of the laser beam relatively moves from the inside of the ingot to the outer periphery.SELECTED DRAWING: Figure 9
申请公布号 JP2016197700(A) 申请公布日期 2016.11.24
申请号 JP20150078030 申请日期 2015.04.06
申请人 DISCO ABRASIVE SYST LTD 发明人 HIRATA KAZUYA;NISHINO YOKO
分类号 H01L21/304;B23K26/53;B28D5/02 主分类号 H01L21/304
代理机构 代理人
主权项
地址