| 摘要 |
<p>PURPOSE:To make it possible to effect a precise photolithography by forming a base film layer and a protective film layer with a film made of the same material respectively, and by using the protective film having a larger critical surface tension than that of the base film. CONSTITUTION:Both the base film layer and the protective film layer are formed by the film made of the same material with each other. The protective film has the larger critical surface tension than that of the base film by >=3 dyness/cm, thereby producing a difference of the adhesive forces of the adhesive agent between the base film layer and the protective film layer in the shade layers. The dimentional stability and the heat resisting property, etc., of the titled film are improved remarkably by forming the base film layer and the protective film with the film made of the same material, thereby lessening a tendency for generating troubles about a curl, a swell, and a float, etc. As the critical surface tension of the protective film layer is larger than that of the base film layer by >=3dyness/cm, the good peeling property in the base film layer is maintained, thereby making it unnecessary to provide the peeling layer on the base film layer.</p> |
