发明名称 Manufacturing method of circuit board
摘要 A manufacturing method of a circuit board is provided. A circuit substrate having a first surface and at least a first circuit is provided. A dielectric layer having a second surface and covering the first surface and the first circuit is formed on the circuit substrate. The dielectric layer is irradiated by a laser beam to form a first intaglio pattern, a second intaglio pattern and at least a blind via. A first conductive layer is formed in the first intaglio pattern, the second intaglio pattern and the blind via. A barrier layer and a second conductive layer are formed in the second intaglio pattern and the blind via. Parts of the second conductive layer, parts of the barrier layer and parts of the first conductive layer are removed until the second surface of the dielectric layer is exposed, so as to form a patterned circuit structure.
申请公布号 US9510464(B2) 申请公布日期 2016.11.29
申请号 US201213590815 申请日期 2012.08.21
申请人 Unimicron Technology Corp. 发明人 Tseng Tzyy-Jang;Chiang Shu-Sheng;Chen Tsung-Yuan
分类号 H05K3/46;H05K3/04;H05K3/10;C23C18/16;H05K1/02;H05K3/00 主分类号 H05K3/46
代理机构 J.C. Patents 代理人 J.C. Patents
主权项 1. A manufacturing method of a circuit board, comprising: providing a circuit substrate having a first surface and at least a first circuit; forming a dielectric layer on the circuit substrate, the dielectric layer having a second surface and covering the first surface and the at least a first circuit; irradiating the dielectric layer by a laser beam to form a first intaglio pattern, a second intaglio pattern, and at least a blind via extending from the second surface of the dielectric layer to the at least a first circuit of the circuit substrate; forming a first conductive layer in the first intaglio pattern, the second intaglio pattern, and the at least a blind via, wherein the first conductive layer fills the first intaglio pattern and is disposed on an inner wall of the second intaglio pattern and an inner wall of the at least a blind via, and an entire volume of the first intaglio pattern is full of the first conductive layer; forming a barrier layer in the second intaglio pattern and the at least a blind via, the barrier layer covering the first conductive layer; forming a second conductive layer in the second intaglio pattern and the at least a blind via, the second conductive layer covering the barrier layer; and removing parts of the second conductive layer, parts of the barrier layer, and parts of the first conductive layer until the second surface of the dielectric layer is exposed to form a patterned circuit structure, the patterned circuit structure being located in the first intaglio pattern, the second intaglio pattern, and the at least a blind via and being electrically connected to the at least a first circuit of the circuit substrate.
地址 Taoyuan TW