发明名称 ELECTRON CYCLOTRON RESONANCE ION SOURCE
摘要 <p>An electron cyclotron resonance ion source in which a plasma is confined in a magnetic configuration having a first group of coils located in the plane define by the tight window of an ultra-high frequency injector and surrounding the latter, supplying the magnetic field creating and confining a plasma as well as a second group of coils supplied in counter-field compared with the first group and surrounding an ion extraction system. Ion extraction takes place in a magnetic field well below that corresponding to the cyclotron resonance. This ion source has numerous applications in the field of thin layer sputtering, microetching, ion implantation, accelerators, etc. (Fig 2a).</p>
申请公布号 CA1232375(A) 申请公布日期 1988.02.02
申请号 CA19840454349 申请日期 1984.05.15
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 DALAUNAY, MARC;GUALANDRIS, RENE;GELLER, RICHARD;JACQUOT, CLAUDE;LUDWIG, PAUL;MATHONNET, JEAN-MARC;ROCCO, JEAN-CLAUDE;SERMET, PIERRE;ZADWORNY, FRANCOIS;BOURG, FRANCOIS
分类号 H01J37/08;H01J27/02;H01J27/18;H05H7/08;(IPC1-7):H01J27/18 主分类号 H01J37/08
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