MASK, MANUFACTURING METHOD THEREOF AND EXPOSURE APPARATUS

摘要

The present invention provides a mask, comprising a base substrate, a first mask pattern formed on an upper surface of the base substrate, and a second mask pattern formed on a lower surface of the base substrate. Each of the first and second mask patterns comprises a light transmissive region and a light blocking region. A projection of the light transmissive region of the first mask pattern on a plane where the second mask pattern is located is outside the light blocking region of the second mask pattern, and the light blocking region of the second mask pattern can block at least part of light diffracted at a boundary between the light blocking region and the light transmissive region of the first mask pattern, to prevent the at least part of light from emitting from the light transmissive region of the second mask pattern.

主权项

1. A mask, comprising:
a base substrate; a first mask pattern formed on an upper surface of the base substrate; and a second mask pattern formed on a lower surface of the base substrate; wherein, the first mask pattern comprises a light transmissive region and a light blocking region, the second mask pattern comprises a light transmissive region and a light blocking region, a projection of the light transmissive region of the first mask pattern on a plane where the second mask pattern is located is outside the light blocking region of the second mask pattern, and the light blocking region of the second mask pattern is capable of blocking at least part of light diffracted at a boundary between the light blocking region and the light transmissive region of the first mask pattern, to prevent the at least part of light from emitting from the light transmissive region of the second mask pattern.