发明名称 METHOD AND APPARATUS FOR ADJUSTING THE OPTICAL AXIS OF AN ELECTRON MICROSCOPE
摘要 An apparatus and a method for adjusting the optical axis of the electron microscope is disclosed, in which the convergence of the electron beam radiated on a specimen is adjusted by a radiation lens system, the optical axis of the electron beam is adjusted by electron beam deflectors, the electron beam from the specimen is focused to form an enlarged image of the specimen in an image-forming lens system, and the enlarged image is displayed while at the same time detecting the electron beam quantity by a phosphor plate. The optical axis is set by controlling the electron beam deflectors in a manner to maximize the electron beam quantity detected by the phosphor plate.
申请公布号 DE3378089(D1) 申请公布日期 1988.10.27
申请号 DE19833378089 申请日期 1983.03.04
申请人 HITACHI, LTD. 发明人 KOBAYASHI, HIROYUKI
分类号 H01J37/04;H01J37/147;H01J37/26;(IPC1-7):H01J37/26 主分类号 H01J37/04
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