| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad in which a surface of a polishing layer is softened in polishing.SOLUTION: There is provided a polishing pad having a polishing layer formed of a polyurethane resin, where the polishing layer is formed by curing a polyisocyanate compound, a polyol compound, a curing agent, and a polyurethane resin curable composition containing a fine hollow sphere, and has a surface layer portion which is softened at least in polishing while saturated.SELECTED DRAWING: None |
