摘要 |
PROBLEM TO BE SOLVED: To provide a salt, an acid generator, a resist composition and the like, from which a resist pattern can be produced with good CD uniformity (CDU).SOLUTION: The salt includes a group represented by formula (aa), preferably formula (aa1) in a cation. In the formula, Xand Xeach independently represent an oxygen atom or a sulfur atom; Xrepresents a divalent saturated hydrocarbon group having 1 to 12 carbon atoms and having at least one fluorine atom; * represents a bonding site; and ring W represents an alicyclic hydrocarbon group having 3 to 36 carbon atoms, in which a methylene group included in the alicyclic hydrocarbon group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group, a hydrogen atom included in the alicyclic hydrocarbon group may be represented by a hydroxy group or a hydrocarbon group having 1 to 12 carbon atoms, and a methylene group included in the hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.SELECTED DRAWING: None |