发明名称 SALT, ACID GENERATOR, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a salt, an acid generator, a resist composition and the like, from which a resist pattern can be produced with good CD uniformity (CDU).SOLUTION: The salt includes a group represented by formula (aa), preferably formula (aa1) in a cation. In the formula, Xand Xeach independently represent an oxygen atom or a sulfur atom; Xrepresents a divalent saturated hydrocarbon group having 1 to 12 carbon atoms and having at least one fluorine atom; * represents a bonding site; and ring W represents an alicyclic hydrocarbon group having 3 to 36 carbon atoms, in which a methylene group included in the alicyclic hydrocarbon group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group, a hydrogen atom included in the alicyclic hydrocarbon group may be represented by a hydroxy group or a hydrocarbon group having 1 to 12 carbon atoms, and a methylene group included in the hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.SELECTED DRAWING: None
申请公布号 JP2016210765(A) 申请公布日期 2016.12.15
申请号 JP20160085869 申请日期 2016.04.22
申请人 SUMITOMO CHEMICAL CO LTD 发明人 ADACHI YUKAKO;ICHIKAWA KOJI
分类号 C07D321/10;C07C309/12;C07C309/17;C07D327/06;C09K3/00;G03F7/004;G03F7/038;G03F7/039;G03F7/20 主分类号 C07D321/10
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