首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
PLASMA ETCHING APPARATUS
摘要
申请公布号
JPH01123421(A)
申请公布日期
1989.05.16
申请号
JP19870281002
申请日期
1987.11.09
申请人
TOSHIBA CORP
发明人
FUJIWARA NAOYOSHI;HAMASHIMA KOTARO;HIKICHI TAKASHI
分类号
H01L21/302;H01L21/3065
主分类号
H01L21/302
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Coin actuated gaming machine.
Mixing device with a variable section for the different jets of a jet engine.
Process for selectively separating water vapour from a gaseous mixture.
Ball bearing with a sensor device.
Fast neutron nuclear reactor comprising an intermediate heat exchanger.
Dispensing device.
Piezoelectric actuator having parallel arrangement of a single piezoelectric element and a pair of displacement magnification arms.
A process for the optical resolution of a racemic acid.
Improvement in the synthesis of 6-methylene derivatives of androsta-1,4-diene-3,17-dione.
Socket contact for an electrical connector.
Neodymium-boron-iron magnet assembly and method of making same.
改进的仪表着陆系统
Data base system including memorandum information and method for managing memorandum information.
Method for fabricating a superconductive film.
Method for inhibiting listeria monocytogenes using a bacteriocin.
Electret filter made of fibers containing polypropylene and poly(4-methyl-1-pentene).
Semiconductor device and method of manufacturing same.
Hot runner nozzle.
利用内燃机废气取暖的装置
老年保健报警器
