| 摘要 |
PURPOSE:To finish a wafer by grinding so as to have excellent smooth surface by making a fine grinding compound contain a specific polysaccharide high molecular compound. CONSTITUTION:When a wafer is ground, a polysaccharide high molecular compound formed by graft-polymerizing an acrylamide in a slurried compound improves drag reducing effect to form a laminar flow between an abrasive cloth and the wafer for preventing the occurrence of a turbulent flow. The surface of the ground wafer therefore becomes so smooth that its irregularity can not be found even by observation made through a differential interference microscope. In addition, the polysaccharide high molecular compound has high resisting ability against biochemical decomposition caused by a microorganism. Thus the above-mentioned compound can be steadily stored as an effective abrasive for long term. |
