发明名称 Substrate of a hybrid ic, method of forming a circuit pattern and apparatus of forming the same
摘要 A hybrid IC substrate has a substrate body and a retaining film which is formed on a surface of the substrate body. The retaining film enables a solution containing a circuit-element-forming material to permeate therethrough and retains the solution on the substrate body. The solution, which is expelled onto the hybrid IC substrate in the form of liquid drops, permeates the above-mentioned retaining film and becomes attached to the surface of the substrate body. Then, the hybrid IC substrate is baked. The retaining film is thus baked off, thereby forming a film of the circuit-element-forming material as a circuit pattern on the substrate body.
申请公布号 US4891242(A) 申请公布日期 1990.01.02
申请号 US19870068914 申请日期 1987.07.01
申请人 KABUSHIKI KAISHA TOYODA JIDOSHOKKI SEISAKUSHO;HATTORI, SHUZO 发明人 ITO, TAKATOSHI;YOSHIDA, AKIHIRO;SHIMAZAKI, KAZUNORI;HATTORI, SHUZO
分类号 H05K3/10;H01L21/48;H05K3/12 主分类号 H05K3/10
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