| 摘要 |
<p>A position detector for use with an X-ray exposure apparatus and the like includes sector Fresnel zone plates (SFZP) which are provided on a mask (14) and a wafer (15) minutely spaced in position in the direction of the optical axis of an exposure X-ray, as alignment marks (16, 17). A laser ray of at least one wavelength is applied to the surfaces of the SFZPs at an angle with respect to the surfaces. The SFZPs are designed such that the principal focal planes of Fresnel diffraction images of the SFZPs to a single wavelength laser ray agree with each other. In the case of illumination rays of a plurality of wavelengths, an objective lens (9) is provided in a detection optical system (10) which objective has such an axial chromatic aberration that focal planes of the objective lens to the plural wavelength rays agree with respective Fresnel diffraction focal planes of the SFZPs to the rays. The image formed on the superposed focal plane of the objective lens is converted into an electric signal, which is handled to detect a relative position between the mask and wafer in the direction perpendicular to the surface thereof.</p> |
