DEVICE FOR FORMING THIN COMPOUND FILM

摘要

Device comprises a vacuum chamber (1A) contg. a substrate (2); an internal vessel (12) within the chamber having an opening opposite the substrate; gas jet nozzles (13,14) arranged inside (IA) connected to external reactive gas sources (6,7) for jetting the gases to the substrate via the opening; and electron beam source (s) (17) for irradiating the gases after their emission from the jet nozzles. Pref. an accelerator (19) is also provided in (IA) for the irradiated reactive gases.