| 摘要 |
PROBLEM TO BE SOLVED: To provide a distributed patterned mask capable of reducing or eliminating a stitching effect in a laser ablation process for imaging a complete pattern onto a substrate.SOLUTION: A mask 86 has a plurality of apertures 88, 89 for transmission of light and non-transmissive areas around the apertures. When the apertures for the distributed pattern are repeatedly imaged on a substrate, structures within the distributed pattern merge within different areas of the imaged pattern to create a complete pattern with distributed stitch lines. The mask which can also form a sparse and distributed pattern, includes apertures that individually form merging portions of the complete pattern and collectively form a distributed pattern.SELECTED DRAWING: Figure 9 |
