发明名称 MANUFACTURE OF HIGHLY FLAT SUBSTRATE AND POLISHING MACHINE
摘要 PURPOSE:To make relative speed of a substrate to that of a surface plate uniform and make the substrate highly flat by mounting knotched sections having arbitrary shapes on the periphery of the surface plate. CONSTITUTION:Both sides are polished by using a surface plate 4 having knotched sections of arbitrary shapes on its periphery. At this time, relative speed difference and pressure distribution difference between each point of a substrate 6 and the surface plate 4 which occur due to the fact that peripheral speed differs between a solar gear 1 side and internal gear 2 side are reduced in a knotched section 5 provided on the periphery of the surface plate 4, and relative speed, pressure distribution, and travel distance are made uniform at each point of the substrate 6. Consequently, it is possible to manufacture highly flat substrate which has no unevenness in thickness.
申请公布号 JPH03117559(A) 申请公布日期 1991.05.20
申请号 JP19890253281 申请日期 1989.09.28
申请人 SHIN ETSU CHEM CO LTD 发明人 FUJIMURA YORITO;SHIBANO YUKIO
分类号 B24B37/12 主分类号 B24B37/12
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