发明名称 METHOD AND APPARATUS FOR MONITORING ALIGNING ACCURACY OF STEPPER
摘要 PURPOSE:To analyze alignment error factors based on an alignment error and stepper processing conditions, calculate changed items of the processing conditions and the change value, and set the value in the stepper by transferring alignment error measurement data of an alignment accuracy inspection apparatus and processing condition data of the stepper from the respective facilities to a computer. CONSTITUTION:A computer for receiving set processing conditions of a stepper being a reducing projection aligner of semiconductor manufacturing facility and inspection results of an alignment inspection apparatus for inspecting alignment accuracy of semiconductor integrated circuit patterns processed by the stepper analyzes accuracy error factors of the inspection results to output a compensation value of the set processing conditions of the stepper. For example the computer receives and acquires processing condition data of the stepper and alignment inspection data of the alignment inspection apparatus, analyzes factors of alignment inspection data and determines an alignment error and a manufacturing standard error. When the alignment error is larger than the manufacturing standard error, an offset change value of the alignment error factor is calculated and the offset value is again set in the stepper as processing conditions of the stepper.
申请公布号 JPH03194914(A) 申请公布日期 1991.08.26
申请号 JP19890331372 申请日期 1989.12.22
申请人 HITACHI LTD 发明人 SAKATA MASAO;NAKAZATO JUN;IRIKITA NOBUYUKI;OKABE TSUTOMU
分类号 G03F9/00;H01L21/027;H01L21/30 主分类号 G03F9/00
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